1 Review
Friendly work environment and good people to work with .
Not sure about the growth opportunities. Little away from Seattle.
Patterning performance strongly depends on resist/underlayer adhesion. With the appropriate resist/underlayer adhesion, one can realize 28-nm pitch printing with defect-free depth of focus larger than 300 nm and unbiased line-width roughness around 2.2 nm.
Optica awards the most distinguished of all member categories to Nobel Laureate and 2013 President WASHINGTON – Optica (formerly OSA), Advancing